Used processing in Georgia, USA

Semitool Spray Solvent Tool (SST-421)

• Manufacturer: Semitool
• Model: SST-421

SEMITOOL SPRAY SOLVENT TOOL (SST) consisting of: - Model: 421 - Automated Spray Solvent Tool (SST)- Process Applications: Polymer Removal, Resist Stripping, Wafer Cleaning, Metal Lift-Off- Batch Solvent Process...

Semitool Spray Solvent Tool (SST-421)

• Manufacturer: Semitool
• Model: SST-421

Semitool Spray Solvent Tool (SST-421) consisting of:- Model: SST-421- Semi-Automated Spray Solvent Tool (SST)- Batch Solvent Processor for Wafer Cleaning- Max Substrate Size of 8”/200mm

Semitool Sirius System

• Manufacturer: Semitool
• Model: Sirius

SEMITOOL SIRIUS HYDROZONE SYSTEM consisting of:- Model: Sirius HydrOzone- Wafer Size: 150mm & 200mm wafer capable- Process: DI water/ozone- Rinse: DI water with ammonium hydroxide- Dry: N2- Spray processing chamb...

MicroTech Solvent Wet Bench

MicroTech Solvent Wet Bench consisting of:- 2 IPA Tanks- 2 Process Tanks - Megasonic Tank w/ Recirculation - Ultrasonic Tank w/ Recirculation- Capable of Processing 6 & 8" Wafers- Robotic Handling- Vintage: Appro...

Semitool Scepter Spray Solvent Tool (SST-421)

• Manufacturer: Semitool
• Model: SST-421

Semitool Scepter Spray Solvent Tool (SST-421) consisting of:- Model: SST-421- Semi-Automated Spray Solvent Tool (SST)- Batch Solvent Processor for Wafer Cleaning- Max Substrate Size of 8”/200mm- Single Chamber Sy...

Oxford PlasmaPro NGP1000 PECVD

• Manufacturer: Oxford
• Model: PlasmaPro NGP1000

OXFORD PLASMAPRO NGP1000 PECVD SYSTEM consisting of:- Model: Oxford PlasmaPro NGP1000 PECVD- Load Locked Chamber - System PC, Keyboard, Mouse- Windows 7 w/ PC4500 Control Software- X20 PLC- 490mm Diameter Aluminu...

Plasmatherm SLR-720 RIE System

• Manufacturer: Plasma-Therm
• Model: SLR-720

PLASMATHERM SLR-720 RIE consisting of:- Model: SLR-720- Single chamber with load lock- Currently configured for 4" wafers - Can process up to 8"/200mm wafers (with proper tooling, available at additional cost) - ...

Oxford Plasmalab 100 PECVD

• Manufacturer: Oxford
• Model: PlasmaLab 100

OXFORD PLASMALAB 100 PECVD consisting of:- Model: Plasmalab 100 PECVD- Process: SiO2 and SiN deposition- Max Wafer Size Capable: 8"/200mm- Single wafer process up to 8-inch wafer- Load Locked Chamber- 600W RF Gen...

Oxford Plasmalab 100 RIE System

• Manufacturer: Oxford
• Model: PlasmaLab 100

OXFORD PLASMALAB 100 RIE SYSTEM consisting of:- Model: Plasmalab 100 Plus- Up to 8"/200mm wafer handling- Allows small batch processing for R&D and Pilot Production- Load-locked System- Computer, Keyboard, New Fl...

Tepla 600 Semi-Automatic Plasma Asher

• Manufacturer: TePla
• Model: 600

TEPLA 600 PLASMA ASHER consisting of: - Model: 600 SemiAuto- Semi-Automatic RF Plasma System - Can process up to 150mm wafers- Used for photoresist stripping and surface cleaning, as well as etching silicon and i...

Oxford Plasmalab 100 ICP-RIE 180

• Manufacturer: Oxford
• Model: PlasmaLab 100

OXFORD PLASMALAB 100 ICP ETCHER consisting of:- Manufacturer: Oxford Instruments- Model: Plasmalab System 100 ICP-RIE 180- Process gases used: H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, HBr, Cl2 and BCl3- Cryo Tabl...

Oxford Plasmalab 80 Plus RIE System

• Manufacturer: Oxford
• Model: PlasmaLab 80

OXFORD PLASMALAB 80 PLUS RIE ETCHER consisting of: - Model: Plasmalab 80 Plus RIE - Single Chamber RIE, non-load locked - Ideal for R&D reactive ion etch application - Process: Dielectric etch and Desc...

Tepla 300 SemiAuto Plasma Asher

• Manufacturer: TePla
• Model: 300

TEPLA 300 PLASMA ASHER consisting of:- Model: 300 SemiAuto - Manual Wafer Load Plasma Asher- Used for Wafer Cleaning and Descum- Can Process up to 150mm Wafers- Upgraded PLC Controlled- Plasma Chamber: Quartz- P...

Tepla 300 PC Plasma Asher

• Manufacturer: TePla
• Model: 300

Tepla 300 Plasma Asher consisting of:- Model: 300 PC Main System- Manual wafer load plasma asher- Designed for Wafer Cleaning and Descum- Plasma Chamber: Quartz- Plasma Chamber Dims: 245mm diameter, 380mm depth- ...