Oxford Plasmalab 100 ICP-RIE 180 in Decatur, GA, USA

OXFORD PLASMALAB 100 ICP ETCHER consisting of:- Manufacturer: Oxford Instruments- Model: Plasmalab System 100 ICP-RIE 180- Process gases used: H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, HBr, Cl2 and BCl3- Cryo Table w/ operating temp: -150 to 400C - Substrate cooling: using liquid nitrogen (LN2) - RF source 300 W, 13.56 MHz- ICP source 3000 W, 13.56 MHz- Base pressure: 5E-7 Torr- Horiba Laser Endpoint Detector- Load LockedPumps:Main Chamber Backing Pump:- Manufacturer: Adixen- Type: Dry pump (multi roots) - Model: ADP 122 PMain Chamber Turbo Pump:- Manufacturer: Adixen - Type: Turbo- Model: ATH 1300Load Lock:- Manufacturer: Adixen- Type: Dry pump (multi roots) - Model: ACP 15GREFURBISHED TO MEET OEM SPECIFICATIONS consisting of:- Chamber disassembled for refurbishment.- Chamber received full wet clean.- Chamber o-rings and seals are replaced with brand new.- Electrostatic Chuck (ESC) sent out for refurbishment (if applicable)- All MFCs rebuilt and calibrated professionally.