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2006 Jipelec JetFirst 200
- Manufacturer: Jipelec
Jipelec JetFirst 200 RTP system is good status. The system has been used for research and development applications in a European laboratory for 15 years. The furnace is a 200 mm RTP tool with cold wall chamber. I...
Montpellier, France
2008 AMAT ENDURA 2
- Manufacturer: Amat
- Model: Endura
Wafer size: 12" | Gas process: Ti | Shipping: EXW`
South Korea
2010 AMAT ENDURA2
- Manufacturer: Amat
- Model: Endura
Wafer size: 12" | Gas process: AL Ti | Shipping: EXW`
South Korea
Linear Sputter
This series of Linear Sputter PVD systems allows for high throughput production on large substrates, can be seamlessly integrated into larger clusters of production tools, and provides impressive uniformity. Usin...
Singapore
LPCVD: Low Pressure Chemical Vapour Deposition System
Low Pressure Chemical Vapour Deposition System Designed and manufactured to meet the high temperature and rapid cooling requirements of graphene and CNT research, Angstrom’s LPCVD (Low Pressure Chemical Vapour De...
Singapore
Gyeonggi-do, South Korea
PECVD Plasma enhanced chemical vapor deposition equipment
PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...
Guangzhou, China
PVD Physical vapor deposition
PVD Physical vapor deposition Product introduction: It is widely used in the batch production of semiconductor and LED production lines, and can meet the various process requirements for the uniform deposition of...
Guangzhou, China