Semiconductors » Wafer Cleaning

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Used system sensor

  • Trusted Seller
    DNS SS-80BW-AR 2F2B

    DNS SS-80BW-AR 2F2B

    • Manufacturer: Dainippon Screen
    • Model: SS-80BW-AR

    Config: 2F2B Indexer, 2-SSW, 2-SSR, 2-RVS(R/R) Open Cassette Type: 4-stage Main Controller: NEC Industrial PC Language: English version Top-side Spin Unit Nano Spray with Brush, Back-rinse, DI-1, -2 Vacuum...

    ASIA
  • Trusted Seller
    no-image_en.png

    DNS SS-80BW-AR

    • Manufacturer: Dainippon Screen
    • Model: SS-80BW-AR

    Config: 2F2B Indexer, 2-SSW, 2-SSR, 2-RVS(R/R) Open Cassette Type: 4-stage Main Controller: NEC Industrial PC Language: English version Top-side Spin Unit Nano Spray with Brush, Back-rinse, DI-1, -2 Vacuum...

    ASIA
  • Trusted Seller
    2005 DNS SS 3000-AR

    2005 DNS SS 3000-AR

    • Manufacturer: Dainippon Screen
    • Model: SS-3000AR

    With Software and HDD As Is Wafer size 12" Process WAFER SCRUBBER 1) SYSTEM COMPOSITION SS 3000-AR 4 BACK SIDE 1 Load Port 3 2 INDEX UNIT 1 3 MAIN BODY 1 4 POWER BOX 2) GENERAL SPEC WAFER TYPE THICKNES...

    Asia
  • Trusted Seller
    2007 DNS SS 3000-AR

    2007 DNS SS 3000-AR

    • Manufacturer: Dainippon Screen
    • Model: SS-3000AR

    With Software and HDD As Is Wafer size 12" Process: WAFER SCRUBBER 1) SYSTEM COMPOSITION SS 3000-AR 4 BACK SIDE 1 Load Port 3 2 INDEX UNIT 1 3 MAIN BODY 1 4 POWER BOX 1 2) GENERAL SPEC WAFER TYPE THICK...

    Asia
  • Trusted Seller
    2004 DNS SS 3000-AR

    2004 DNS SS 3000-AR

    • Manufacturer: Dainippon Screen
    • Model: SS-3000AR

    With Software and HDD As Is Wafer size 12" Process WAFER SCRUBBER 1) SYSTEM COMPOSITION SS 3000-AR: 4 BACK SIDE 1: Load Port 3 2: INDEX UNIT 1 3: MAIN BODY 1 4: POWER BOX 1 2) GENERAL SPEC WAFER: TYPE ...

    Asia
  • Trusted Seller
    2006 DNS SS 3000-AR

    2006 DNS SS 3000-AR

    • Manufacturer: Dainippon Screen
    • Model: SS-3000AR

    Wafer size 12" Process WAFER SCRUBBER 1) SYSTEM COMPOSITION SS 3000-AR 4 BACK SIDE 1: Load Port 3 2: INDEX UNIT 1 3: MAIN BODY 1 4: POWER BOX 1 2) GENERAL SPEC WAFER TYPE THICKNESS DIAMETER MAIN PRESSUR...

    Asia

Overview

Wafer cleaning equipment removes particles, organics, metals and films from semiconductor wafers during manufacturing. Systems range from wet benches and single‑wafer processors to spin/rinse dryers, megasonic cleaners and plasma cleaners. They control chemicals, temperature, agitation and DI water purity to meet strict contamination limits. Used units are common for fab expansion, R&D and contract manufacturing where cost savings or quick delivery matter.

FAQ

What should I inspect when buying a used wafer cleaning system?

Check maintenance and chemical-use records, condition of pumps, seals, valves and DI loops, presence of contamination, control software version, spare parts availability and any retrofits. Confirm process compatibility with your chemistries and wafer sizes.

How should a wafer cleaner be prepared and shipped?

Drain and neutralize chemicals, flush DI water loops, secure fragile components (transducers, optics, sensors), purge sensitive electronics, crate on vibration‑isolating mounts and use climate‑controlled transport. Declare hazardous materials and coordinate qualified rigging for loading and installation.

What routine maintenance keeps a wafer cleaner reliable?

Maintain DI water quality, replace filters and chemical lines on schedule, inspect pumps and seals, verify megasonic/plasma performance, clean tanks and wet benches, and keep software and logs updated. Follow manufacturer service intervals and qualification steps after major repairs.