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    2015 Ulvac NE 950 EX

    2015 Ulvac NE 950 EX RIE Etch System

    • Manufacturer: Ulvac
    • Model: NE-950EX

    - With process gases BCl₃, Cl₂, SiCl₄, CF₄, SF₆, C₄F₈, O₂, and Ar, this versatile ICP etcher is designed to etch GaN, sapphire, metals, ITO, SiC, AlN, ZnO and others - Patented ICP with magnetic confinement (“ISM...

    United States
  • 2012 ICP Etcher ULVAC NE950

    2012 ICP Etcher ULVAC NE950

    • Manufacturer: Ulvac
    • Model: NE-950

    GAS BOX CONFIG GAS 1 HORIBA STEC SEC-E40 Ar 100SCCM GAS 2 HORIBA STEC SEC-E40 O2 100SCCM GAS 3 HORIBA STEC SEC-E40 CHF3 100SCCM GAS 4 HORIBA STEC SEC-E440J BCL3 200SCCM GAS 5 HORIBA STEC SEC-E440J CL2 200SCC...

    Wu Xi Shi, China