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Used metal processing in Japan

  • Ion Etching System

    Ion Etching System

    • new

    Substrate：CarbideCoating type：AlCrN(2-3μm) Series: IE series | Size: W 2,300mm | Weight: D 1,400mm | Gas: H 2,350mm | Ion guns: Approx. 1,600kg | Max elec. consumption: Ar, O2 | Carbon: 4, 6, 8 sources | Nitridin...

    Kobe, Japan