Plasmatherm SLR720 shuttle lock RIE for compound semiconductor etching
- Manufacturer: Plasma-Therm
- Model: SLR-720
Plasmatherm SLR-720 RIE tool Configured for etching of metals and compound semiconductors Previous usage was etching of GaAs with chlorine chemistry PC controller. Vacuum load lock with wafer transfer robot. ...
$75,000 USDSan Jose, CA
Plasmatherm SLR 770 shuttle lock ICP inductively coupled plasma etch system for compound semiconductor process
- Manufacturer: Plasma-Therm
- Model: SLR
Plasmatherm SLR-770 ICP Shuttle Lock Inductively Coupled Plasma Etch System. Configured for etching of metals and compound semiconductors Previous usage was deep etching of GaAs with chlorine chemistry PC cont...
$110,000 USDSan Jose, CA
GaSonics PEP 3510A/A Dual Chamber
- Manufacturer: GaSonics
The GaSonics PEP 3510A is a versatile microwave downstream photoresist removal system, designed for clean, damage-free removal of photoresist. PEP 3510A utilizes a combination of platen and lamp wafer heating res...
San Jose, CA
GaSonics L3510 Single Wafer Ashing System
- Manufacturer: GaSonics
The GaSonics L3510 is a versatile downstream photoresist removal system, designed for clean, damage-free removal of the most difficult resist structures. Utilizing the production-proven L-Series platform, the L35...
San Jose, CA
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