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- Trusted Seller
KLA-Tencor Wafer Lift Pin Assembly 250-100-C RBEHE-00510-012 eS31 E-Beam Working
- Manufacturer: KLA-Tencor
“Removed from a KLA-Tencor eS31 E-Beam Wafer Inspection System” KLA-Tencor Wafer Lift Pin Assembly 250-100-C RBEHE-00510-012 eS31 E-Beam Working Inventory # 20943 Removed from a KLA-Tencor eS31 E-Beam Wafer Inspe...
$1,504 USDAlbuquerque, NM - Trusted Seller
KLA-Tencor eS31 Chamber Lift Assembly 720-22600-000 211-22980-000 Working
- Manufacturer: KLA-Tencor
“Removed from a KLA-Tencor eS31 E-Beam Wafer Inspection System” KLA-Tencor eS31 Chamber Lift Assembly 720-22600-000 211-22980-000 Working Model No: Chamber Lid Removed from a KLA-Tencor eS31 E-Beam Wafer Inspecti...
$3,504 USDAlbuquerque, NM - Trusted Seller
KLA-Tencor 740-23237-000 300mm Wafer Chuck Platen 740-23200-000 eS31 Working
- Manufacturer: KLA-Tencor
“Removed from a KLA-Tencor eS31 E-Beam Wafer Inspection System” KLA-Tencor 740-23237-000 300mm Wafer Chuck Platen 740-23200-000 eS31 Working Inventory # 20731 740-23200-000 Removed from a KLA-Tencor eS31 E-Beam W...
$3,503 USDAlbuquerque, NM - Trusted Seller
KLA-Tencor eS31 Chamber Rotation Assembly 720-11046-000 730-20202-000 Working
- Manufacturer: KLA-Tencor
“Removed from a KLA-Tencor eS31 E-Beam Wafer Inspection System” KLA-Tencor eS31 Chamber Rotation Assembly 720-11046-000 730-20202-000 Working Model No: Chamber Rotation Assembly Removed from a KLA-Tencor eS31 E-B...
- Trusted Seller
KLA-Tencor 720-20466-000 Linear X/Y Stage Schneeberger 565 090 643 eS31 Working
- Manufacturer: KLA-Tencor
“Removed from a KLA-Tencor eS31 E-Beam Wafer Inspection System” KLA-Tencor 720-20466-000 Linear X/Y Stage Schneeberger 565 090 643 eS31 Working Inventory # 21037 Schneeberger Part No: 565 090 643 Removed from a K...
$3,504 USDAlbuquerque, NM - Trusted Seller

Hitachi S-4700-II
- Manufacturer: Hitachi
- Model: S-4700
Process Type: FA SEMs/TEMs/Dual Beams Wafer Size: N/A Status of Equipment: Refurbished Configuration Type II stage with 5 axis motorization Type I load lock, 4 inch (optional 6 inch) Full control pad CD Me...
United States - Trusted Seller

2008 Hitachi SU-70
- Manufacturer: Hitachi
- Model: SU70
Process Type: FA SEMs/TEMs/Dual Beams Wafer Size: N//A Date of Manufacture: 2008 Equipment Information: Status of Equipment: Refurbished Resolution Imaging; 1 nm/15 kV, 1.6 nm/1 kV In-lens SE and BSE Signal...
United States - Trusted Seller

Hitachi S-5500
- Manufacturer: Hitachi
- Model: S-5500
Process Type: FA SEMs/TEMs/Dual Beams Specifications: Secondary Electron image resolution: 0.4nm at 30kV and 1.6nm at 1kV Specimen Stage Stage Traverse: X: +3.5mm, Y: +2.0mm, Z:+0.3mm, T: +40 degrees Sample ...
United States - Trusted Seller

2012 HITACHI SU-8040
- Manufacturer: Hitachi
- Model: SU8040
Vintage: 2012 Process Type: FA SEMs/TEMs/Dual Beams Equipment Information: Status of Equipment: Refurbished Specification: Secondary electron image resolution: 1.0nm (15kV, WD=4mm) 1.3nm (1kV, WD=1.5mm, De...
United States - Trusted Seller

Hitachi S-4800-II
- Manufacturer: Hitachi
- Model: S-4800
Vintage: 2004/2007 Process Type: FA SEMs/TEMs/Dual Beams Status of Equipment: Refurbished Specification: Secondary electron image resolution: 1.0nm (15kV, WD=4mm) 1.4nm (1kV, WD=1.5mm, Deceleration mode) 2...
United States - Trusted Seller

Hitachi HD-2300
- Manufacturer: Hitachi
- Model: HD-2300
Process Type: FA SEMs/TEMs/Dual Beams Wafer Size: N/A Status of Equipment: Warehouse 200kV dedicated STEM with thermal FE election source Resolution 0.204nm Phase contract image (TE image), Z-contrast image ...
United States 
2010 RUDOLPH S3000A
- Manufacturer: Rudolph
- Model: S3000A
Wafer size: 12 | Shipping: EXW | Process: Focused Beam Laser Ellipsometry
South Korea
2010 RUDOLPH S3000A
- Manufacturer: Rudolph
- Model: S3000A
Wafer size: 12 | Shipping: EXW | Process: Focused Beam Laser Ellipsometry
South Korea
2010 RUDOLPH S3000A
- Manufacturer: Rudolph
- Model: S3000A
Wafer size: 12" | Process: Focused Beam Laser Ellipsometry | Shipping: EXW
South Korea
2012 RUDOLPH S3000A
- Manufacturer: Rudolph
- Model: S3000A
Wafer size: 8" | Process: Focused Beam Laser Ellipsometry | Chamber: EXW
South Korea
