Semiconductors » Lithography (Photolithography)

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Used Lithography (Photolithography)

DEK 155518 STEPPER MUX BOARD - NEW
- Manufacturer: DEK
DEK 155518 STEPPER MUX BOARD - NEW P/N: 155518 NEW CONDITION LOC MS-4
Largo, FL
NIKON RAYFACT IL50mm PF5028ML
- Manufacturer: Nikon
NIKON RAYFACT IL50mm PF5028ML P/N: PF5028ML USED - IN GREAT WORKING CONDITION LOC K3
Largo, FL
TEL ACT 12 SOD
- Manufacturer: Tokyo Electron - TEL
- Model: ACT-12
Wafer size: 300 | Date available: 31/07/2024 | Group: Electronic | Owner: Micron | Family: Resist Processing Equipment
Stamford, CT
Mania Barco Silver Writer
- Manufacturer: Mania
10047_data 10047_data2 Mod. Silver writer Option: 860MF Part number: G966245 Sn: 192 MANUFACTURED 05/2002 24 beam / 20.000 dpi
Aldersbach, Germany
ORC HMW-680C-2
- Manufacturer: ORC
01035_Daten 2 x 7 kW
Aldersbach, Germany
Mania Barco SilverWriter
- Manufacturer: Mania
Resolution 10.000 dpi
Aldersbach, Germany
OLEC AT 30
- Manufacturer: OLEC
with autom. registration It is a 5 kW-Maschine. A modification up to 8 kW is possible (with new Software and guarantee). Upper drawer in order, lower drawer no camera recognition in function Incl. large spare ...
Aldersbach, Germany
ORC HMW-201B-5K Exposure Unit
- Manufacturer: Cipel Elektronik
Defective. Can be used as spare part source.
Aldersbach, Germany
Toray Engineering Continuous double-sided exposure machine
- Manufacturer: Toray
TE2500WAP 2008
Osaka, Japan
HIGHTECH Continuous Exposure System (R/R Exposure)
- Manufacturer: High-Tech
the-178sr-hc-s2 2000
Osaka, Japan
HITEC SR Exposure System
- Manufacturer: High-Tech
THE-7000MC 1996
Osaka, Japan
HIGHTECH Continuous Exposure System (R/R Exposure)
- Manufacturer: High-Tech
the-178sr-hc-s2 2000
Osaka, Japan
PSK Inc. TERA21
- Manufacturer: PSK Inc.
PSK Tera21
Gyeonggi-do, South Korea
2014 CANON FPA-5510IX
- Manufacturer: Canon
- Model: FPA
CANON FPA-5510ix SN-4101032 Wafer size: 8", 12" | Process: stepper
Gyeonggi-do, South Korea
Wintel EUV
- Manufacturer: Wintel
LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Key Technologies ① Chamber contamination free ② High selectivity ③ rework rate: ＞10 times ④ Design to under layer strip
Gyeonggi-do, South Korea

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Overview

Semiconductor lithography is a critical process in the fabrication of microchips. It involves transferring intricate circuit patterns onto a semiconductor wafer using light or other radiation. This technology is essential for creating the tiny, complex structures found in modern electronics, enabling advancements in computing, communication, and various other fields.

FAQ

What factors should I consider when purchasing semiconductor lithography equipment?

Consider the equipment's resolution capabilities, throughput, compatibility with your production line, and the level of technical support available from the manufacturer.

How is semiconductor lithography equipment typically shipped?

Shipping involves specialized packaging to protect sensitive components, often via air or sea freight. It is important to use a carrier experienced in handling high-tech equipment.

What maintenance does semiconductor lithography equipment require?

Regular maintenance includes cleaning optical components, calibrating the system, and replacing consumable parts. Follow the manufacturer's guidelines for detailed maintenance procedures.