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1993 DNS SKW-60A-BVPE Coater Developer
- Manufacturer: Dainippon Screen
- Model: SK-W60A-BVPE
Dublin, Ireland
Coat/develop tracks are automated wet-process systems used in photolithography to apply photoresist, perform bakes, and develop exposed wafers. They combine spin-coaters, bake plates, developer modules, solvent handling and cassette automation into a single linear track for consistent film thickness and high throughput. Used units differ by cassette size, automation level and chemical compatibility — confirm wafer size, resist types, cleanroom class and factory automation interfaces before buying.
Check cassette capacity, wafer size support, history of chemical use, maintenance logs, pump and spinner condition, and whether OEM parts and service manuals are included.
Arrange certified decontamination, drain and purge chemical lines, secure components for transport, use climate-controlled freight if needed, and get cleanroom contamination paperwork.
Typical needs include DI water, solvent drains, nitrogen and/or dry air, proper electrical supply, exhaust and ventilation, and sometimes chilled water or vacuum lines—verify site specs ahead of time.
Regular tasks include filter and pump replacement, seal and tubing inspection, spinner bearing checks, bake plate calibration and solvent line cleaning; schedule depends on throughput and chemical aggressiveness.
OEM consumables and critical spares can have long lead times; confirm availability of seals, pump parts, spin chucks and controllers or reliable third‑party suppliers before purchase.