Ulvac XeF2 release etch cluster tool FRE-200E
used
- Manufacturer: Ulvac
- Model: FRE-200E
ULVAC - XeF2 Etch Release FRE-200E Manufacturer: ULVAC Model: FRE-200E Equipment Details: RF Power supply. Voltage: 208V Frequency: 60Hz Phase, Wire: 3Phase, 3Wire+ G Line Full Load Current: 142A Max Load(unit): ...
Santa Barbara, CATEFLON SUPPORT WET BENCH SPARE PART STAND
used
TEFLON SUPPORT WET BENCH SPARE PART STAND System was de-installed in working operational condition. All returns must comply with stated Return Policy. Please continue: PAYMENT OPTIONS: We accept Paypal, Company C...
$499 USDSanta Barbara, CAMARCH PX-500 Plasma asher
used
- Manufacturer: March Instruments
- Model: PX500
MARCH PX-500 Plasma asher System was de-installed in working operational condition. All returns must comply with stated Return Policy. Please continue: PAYMENT OPTIONS: We accept Paypal, Company Check, Wire Trans...
Santa Barbara, CABECO NITRO 1 NITROGEN SPRAY GUN
used
INFORMATION: BECO NITRO 1 NITROGEN SPRAY GUN System was de-installed in working operational condition. All returns must comply with stated Return Policy. Please continue: PAYMENT OPTIONS: We accept Paypal, Compan...
$399 USDSanta Barbara, CAGaSonics 7104
used
- Manufacturer: GaSonics
The 7100 Series is the most popular of the GaSonics International industrial batch treatment and cleaning systems. This full-featured system is based on proven reactor features and system drivers developed over t...
San Jose, CAGlen Technologies (Yield Engineering) R3A 500W low frequency Plasma Asher
used
- Manufacturer: Yield Engineering
- Model: R3
PLC controlled and offers real-time plain English readout of system operating parameters together with remedial action in the event of an abort. Active Plasma for routine cleaning of sample surfaces RIE Plasma ...
Gasonics 9104 plasma asher (never installed with new control box)
used
- Manufacturer: GaSonics
- Model: 9104
Features and Specifications Gasonics/IPC 9104 Ash/Etch system 12"(dia) x 20"(D) quartz barrel soft pumping and purge valving low particulate design 2ea mass flow gas inputs with VCR fittings all SS plumbing, mul...
GaSonics PEP Iridia
used
- Manufacturer: GaSonics
The GaSonics PEP Iridia is a dual chamber etcher used to independently deskin (remove a crusted layer of photoresist without penetrating a lower layer of conventional photoresist) or to independently remove photo...
San Jose, CAMarch PX-1000 Batch RIE Asher/Etcher System
used
- Manufacturer: March Instruments
- Model: PX-1000
Downstream RIE or isotropic plasma barrel asher/etcher system. Features: Digital panel meters 5 shelves unit 5 gas output Specifications: 1000 Watt output
San Jose, CAYield Engineering YES-FPO - Dual Function (Vacuum bake/Vapor Prime - Image Reversal)
used
- Manufacturer: Yield Engineering
- Model: YES
Specifications: The FPO vacuum bake/vapor prime process, you can significantly extend time available between process steps. Plus, chemical usage for a vapor deposition process is typically less than 1% of the amo...
San Jose, CAYield Engineering YES-450 PB6-8P Polyimide Bake Oven
used
- Manufacturer: Yield Engineering
- Model: YES-450
Polyimide vacuum bake oven with vacuum pump. Features: High temperature, air cooled, laminar flow oven Operates at temperatures up to 450°C Designated for 8 cassettes of up to 6 in. wafers Front panel PLC control...
San Jose, CAOxford Instruments Plasmalab 800 Plus PECVD with 460mm diameter electrode (2009)
used
- Manufacturer: Oxford
- Model: PlasmaLab 800
Large Capacity Open Loaded Plasma Enhanced Chemical Vapor Deposition System. 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers. Ideally suited for batch PECVD processing where excellent ac...
Plasmatherm SLR 770 shuttle lock ICP inductively coupled plasma etch system for compound semiconductor process
used
- Manufacturer: Plasma-Therm
- Model: SLR
Plasmatherm SLR-770 ICP Shuttle Lock Inductively Coupled Plasma Etch System. Configured for etching of metals and compound semiconductors Previous usage was deep etching of GaAs with chlorine chemistry PC cont...
Plasmatherm SLR720 shuttle lock RIE for compound semiconductor etching
used
- Manufacturer: Plasma-Therm
- Model: SLR-720
Plasmatherm SLR-720 RIE tool Configured for etching of metals and compound semiconductors Previous usage was etching of GaAs with chlorine chemistry PC controller. Vacuum load lock with wafer transfer robot. ...
Plasma-Therm 730 SLR PECVD Load-Locked System
used
- Manufacturer: Plasma-Therm
- Model: SLR
Plasma Shuttle-Lock load-lock loading system with platen transfer. Features: Windows operating system Top electrode is RF powered and the substrate is temperature controlled. Inlcudes vacuum pump with roots blowe...
San Jose, CAYield Engineering YES-450 Surface Treatment / Cleaning
used
- Manufacturer: Yield Engineering
- Model: YES-450
Good condition Yield Engineering YES-450 Surface Treatment / Cleanings manufactured in 2015. Located in USA and other countries. Click request price for more information.
USA