Building Filters

New Surface Treatment / Cleaning

TMP-150/200
- new
This series of equipment is suitable for CMP polishing equipment for thin films (dielectric layers), including oxide, metal, STI, SOI, MEMS and other products of flat polishing. Adopting airbag film flexible pres...
Beijing, China
TFP-2310
- new
The equipment is equipped with 3 polishing stations and 8 polishing heads, which has high processing efficiency. It has polishing disc cooling and temperature monitoring system to ensure the constant temperature ...
Beijing, China
Wintel LPR (Low-Pressure Removal)
- new
- Manufacturer: Wintel
LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Normal ashing process with unique plasma source is possible. In particular, excellent results can beobtained from low O2 & No O2 processes. Low...
Gyeonggi-do, South Korea
ICP lab type PR removal machine
- new
- Manufacturer: Minder Hightech
Application ASHING Polymer removal DESCUM Dry removal of hard mask layer Photoresistance removal after female ion implantation Removal of optical resistance between media Photoresistance removal in BAW/SAW proces...
Guangzhou, China
Cassette type Batch plasma PR removal machine
- new
- Manufacturer: Minder Hightech
Application: DESCUM Wafer cleaning Removing residual glue after wet process Surface residue removal Remove residual glue after exposure and development
Guangzhou, China
PMM-2550AH
- new
PMM-2550AH Semiconductor industry, electronic connector industry, ceramic industry, tungsten steel industry, precision and high precision parts processing industry, precision mold industry, etc.
Shenzhen, China
PMM-2550H
- new
PMM-2550H Semiconductor industry, electronic connector industry, ceramic industry, tungsten steel industry, precision and high precision parts processing industry, precision mold industry, etc.
Shenzhen, China
Semi Auto- Plasma cleaning
- new
- Manufacturer: semiconductor equipment manufacturing
Semiconductor Equipment Manufacturing Co., Ltd. is a well-known company that provides semiconductor equipment products. We provide strict quality control in the company. All our products meet the requirements and...
Hsinchu County, Taiwan
Atmospheric rotary plasma surface treatment machine Atmospheric rotary plasma surface treatment
- new
- Manufacturer: Minder Hightech
Atmospheric rotary plasma surface treatment SPA2800HTechnical specifications(high power version) （1）Product description （1.1）The role of plasma cleaning The principle of plasma cleaning is mainly：（A）Etching on t...
Guangzhou, China
MD-SPV150 Vacuum plasma surface treater
- new
- Manufacturer: Minder Hightech
（1.1）The role of plasma cleaning The principle of plasma cleaning is mainly：（A）Etching on the surface of materials - physical effects A large number of active particles in the plasma, such as a large number of i...
Guangzhou, China
Point-of-Use 3300
- new
Provides uniform and repeatable temperature control The model POU3300 Point-of-Use Thermoelectric Temperature Control System provides uniform and repeatable temperature control for plasma etch applications. The P...
Singapore
Ulvac
- new
- Manufacturer: Ulvac
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...
Munich, Germany
Ulvac
- new
- Manufacturer: Ulvac
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source. ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber. Low process pressure, high den...
Munich, Germany
Ulvac
- new
- Manufacturer: Ulvac
Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...
Munich, Germany
Ulvac
- new
- Manufacturer: Ulvac
NE550H is a multipurpose high-density plasma etching system, specifically for R&D test facilities such as universities and government agencies. Equipped with low-pressure, low-electron-temperature and high-densit...
Munich, Germany