Used Surface Treatment / Cleaning in Wexford, Ireland

Karl Suss Auto Clean WProgram Solvent Dispenser

• used

• Manufacturer: SÜSS MicroTec

Karl Suss Auto Clean W/Program Solvent Dispenser Auto Clean W/Program Solvent Dispenser

Verteq Automated P-Clean Plastic Wet Bench

• used

• Manufacturer: Verteq

Verteq Automated P-Clean Plastic Wet Bench

Maruwa PCS-1700-0C 200mm Cleaning Machine

• used

• Manufacturer: Unknown

Maruwa PCS-1700-0C 200mm Cleaning Machine

Mitsubishi Material Tamagawa 300mm final clean 12

• used

• Manufacturer: Mitsubishi

Mitsubishi Material Tamagawa 300mm final clean 12″

Maruwa HF1-200-3FV-1C 200mm Cleaning Machine

• used

• Manufacturer: Unknown

Maruwa HF1-200-3FV-1C 200mm Cleaning Machine

Maruwa HF1-200-3FV-1C 200mm Cleaning Machine

• used

• Manufacturer: Unknown

Maruwa HF1-200-3FV-1C 200mm Cleaning Machine

Espec SCO-122B-L 2008 Anaerobic Clean Oven

• used

• Manufacturer: Espec

Espec SCO-122B-L 2008 Anaerobic Clean Oven

Maruwa AQW-200-1FV-0C 200mm Wet Tube Cleaning Machine

• used

• Manufacturer: Unknown

Maruwa AQW-200-1FV-0C 200mm Wet Tube Cleaning Machine

Maruwa AQW-200-1FV-0C 200mm Wet Tube Cleaning Machine

• used

• Manufacturer: Unknown

Maruwa AQW-200-1FV-0C 200mm Wet Tube Cleaning Machine

Tepla 300 Plasma Asher

• used

• Manufacturer: TePla
• Model: 300

– Manual Wafer Load Plasma Asher – Used for Wafer Cleaning and Descum – Can Process up to 150mm Wafers – Faraday Cage – Computer PC Controlled – All MFCs Rebuilt and Calibrated – Leybold D65BCS Fomblin Prepped Va...

StripperAsher

• used

• Manufacturer: Unknown

StripperAsher

• used

• Manufacturer: Unknown

System de-installed on 23-May-14. System still located at its Fab location. Process: Etch-Ashing Wafer Handling Configuration -Full batch/ single wafer: Single wafer -Robot: Yaskawa robot -Robot blade: Dual blade...

Dielectric Etch

• used

• Manufacturer: Unknown

Tool is stored in a storage room as of March 25th, 2015. [Chamber A] Chamber type:SCCM Jin Gas config. (sccm)=FCS full scale 2line(advanced radical distribution control) Ar(1776)/C4F6(50.3)/C4F8(43)/CF4(336) O2(6...

StripperAsher

• used

• Manufacturer: Unknown

Novellus / Gasonics PEP 3510A Dual Chamber Downstream Photoresist Removal System SN M981510 Please see actual DS for full config details (linked) Backing Pumps are not included with this system

StripperAsher

• used

• Manufacturer: Unknown

Novellus / Gasonics PEP 3510A Strip/Ash System SN 98040 • Currently Configured for 200mm Wafer Sizes • MFG Date: Jul 1997 • Last PM Date: Oct 27, 2008 • Install Type: Stand Alone • Application: Photoresist Remova...