GaSonics L3510 Single Wafer Ashing System
- Manufacturer: GaSonics
The GaSonics L3510 is a versatile downstream photoresist removal system, designed for clean, damage-free removal of the most difficult resist structures. Utilizing the production-proven L-Series platform, the L35...
San Jose, CA
GaSonics L3510E Isotropic Etch System
- Manufacturer: GaSonics
The GaSonics L3510E is a high etch rate, downstream isotropic etching system, designed to provide isotropic profiles along with the ability to etch or ash at low temperatures. Utilizing the proven L-Series 3510 p...
San Jose, CA
Branson IPC L3200
- Manufacturer: Branson
Dual quartz chambers for 100-150mm wafers, cassette to cassette operation. Features: Automatic pick-and-place wafer handling Automatic pneumatic soft-lift assemblies for each chamber in-line gas filters (0.05 mic...
San Jose, CA
Branson IPC 4000 Barrel Asher
- Manufacturer: Branson
Features: Wafer capability up to 8" RF generator model PM119 Two process gas capability Specifications: Wafer capaility up to 8" 10" quartz chamber
San Jose, CA
GaSonics IPC Series 9104 Plasma Asher
- Manufacturer: GaSonics
The GaSonics 9104 is a plasma asher from the GaSonics IPC series. Features: 12" (diamater) 20" (D) quartz chamber System includes 4 MFC's 1000W automatch network Temperature probe Multistep / multirecipe capabili...
San Jose, CA
SPEC 3510E PC Isotropic Etch System
- Manufacturer: GaSonics
SPEC Equipment has developed the new GaSonics L3510E PC isotropic etching system. Designed for high etch rates, the 3510 PC provides isotropic profiles along with the ability to etch or ash at low temperatures. T...
San Jose, CA
Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum
- Manufacturer: Anatech
Anatech 600 Series Model SP150 Quartz Barrel Plasma Asher / Desum Specifications: Barrel Plasma Asher / Desum Model SP150 Quartz 300W, 13.56Mhz Power Supply Two gas input Quartz Chamber 10" diameter x 18" long 9"...
San Jose, CA
GaSonics PEP Iridia
- Manufacturer: GaSonics
The GaSonics PEP Iridia is a dual chamber etcher used to independently deskin (remove a crusted layer of photoresist without penetrating a lower layer of conventional photoresist) or to independently remove photo...
San Jose, CA
March PX-1000 Batch RIE Asher/Etcher System
- Manufacturer: March Instruments
- Model: PX-1000
Downstream RIE or isotropic plasma barrel asher/etcher system. Features: Digital panel meters 5 shelves unit 5 gas output Specifications: 1000 Watt output
San Jose, CA
Yield Engineering YES-FPO - Dual Function (Vacuum bake/Vapor Prime - Image Reversal)
- Manufacturer: Yield Engineering
- Model: YES
Specifications: The FPO vacuum bake/vapor prime process, you can significantly extend time available between process steps. Plus, chemical usage for a vapor deposition process is typically less than 1% of the amo...
San Jose, CA
Yield Engineering YES-450 PB6-8P Polyimide Bake Oven
- Manufacturer: Yield Engineering
- Model: YES-450
Polyimide vacuum bake oven with vacuum pump. Features: High temperature, air cooled, laminar flow oven Operates at temperatures up to 450°C Designated for 8 cassettes of up to 6 in. wafers Front panel PLC control...
San Jose, CA
Glen Technologies (Yield Engineering) R3A 500W low frequency Plasma Asher
- Manufacturer: Yield Engineering
- Model: R3
PLC controlled and offers real-time plain English readout of system operating parameters together with remedial action in the event of an abort. Active Plasma for routine cleaning of sample surfaces RIE Plasma ...
Oxford Instruments Plasmalab 800 Plus PECVD with 460mm diameter electrode (2009)
- Manufacturer: Oxford
- Model: PlasmaLab 800
Large Capacity Open Loaded Plasma Enhanced Chemical Vapor Deposition System. 460mm diameter electrode offers a capacity of up to twelve 4 in. wafers. Ideally suited for batch PECVD processing where excellent ac...
Plasmatherm SLR 770 shuttle lock ICP inductively coupled plasma etch system for compound semiconductor process
- Manufacturer: Plasma-Therm
- Model: SLR
Plasmatherm SLR-770 ICP Shuttle Lock Inductively Coupled Plasma Etch System. Configured for etching of metals and compound semiconductors Previous usage was deep etching of GaAs with chlorine chemistry PC cont...
Plasmatherm SLR720 shuttle lock RIE for compound semiconductor etching
- Manufacturer: Plasma-Therm
- Model: SLR-720
Plasmatherm SLR-720 RIE tool Configured for etching of metals and compound semiconductors Previous usage was etching of GaAs with chlorine chemistry PC controller. Vacuum load lock with wafer transfer robot. ...
Yield Engineering YES-58 Surface Treatment / Cleaning
- Manufacturer: Yield Engineering
- Model: YES-58
Good condition Yield Engineering YES-58 Surface Treatment / Cleanings manufactured in 2010. Located in USA and other countries. Click request price for more information.
USA
Tip: Enter manufacturer, model or keyword