New Deposition Equipment (Cvd, Pvd)

Optical coating equipment

Optical coating equipment can be used for multi-layer film such as short wave pass, long wave pass, anti-reflection (AR), increased reflection, light filter, light separator, band pass, medium layer, high reflect...

Magnetron

• Manufacturer: Beijing Vacuum Electronic Technology

For Sale KMEDIC KM 35-496 Pilling Super-cut Jamison Sciss 6 1/4" CVD

• Manufacturer: KMEDIC

Super-cut Jamison Sciss 6 1/4" CVD Product: Super-cut Jamison Scissors Surgical Tool Product Description: The Super-cut Jamison Scissors are precision surgical instruments designed for a variety of medical proced...

For Sale PILLING 142235 Pilling Mayo Tissue Dissecting Scissors CVD 9" tc Surgical Instrument 142235

• Manufacturer: Pilling

Curved, 9" (23.0cm), TC Product: Pilling Mayo Tissue Dissecting Scissors Surgical Tool Product Description: The Pilling Mayo Tissue Dissecting Scissors are precision surgical instruments designed for delicate tis...

PlasmaVAC 600W-PVD Plasma Enhanced Chemical Vapor Deposition System

Description Ideal Vacuum PlasmaVAC MAX 600W-PVD Plasma Enhanced Chemical Vapor Deposition System, Commonly Used to Deposit DLC, SiO 2 , Si 3 N 4 , hydrophobic, and hydrophilic coatings. The PlasmaVAC™ MAX serie...

CARBON NANOTUBE MOVING BED

FB-CVD is a device that uses boiling method to produce carbon nanotubes. The catalyst is blown and suspended in a well furnace filled with hydrocarbons using nitrogen gas, and the carbon source gas fully contacts...

ACTIVATED FBR FOR POROUS CARBON

CARBON NANOTUBE MOVING BED

The moving bed (tubular cracking furnace) is a device for catalytic cracking hydrocarbons to produce carbon nanotubes In the production process of mobile method, the catalyst is fixed. The moving bed (tubular cra...

Vacuum system

• Manufacturer: Super Q

CVD Tube Furnace

CVD split type tube furnace Three gas channels with MFC High purity quartz tube Products Description CVD tube furnace is composed of a tubular heating furnace, MFC gas system and vacuum system. The heating furnac...

CVD Mini Tube Furnace

1.1200C CVD mini tube furnace 2.Spilt door type 3.30 or 50segments temperature controller,PID control,±1℃ 4.Three gas channles system float flowmeter. 5.H2 burning and inspection system included Products Descript...

Casting Capped End

Kdk-125: Copper | Kdk-128: Copper

Wintel PE ALD

• Manufacturer: Wintel

LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Low-temperature Si3N4 Wafer temperature ≥250℃ Good film quality (WER, R.I) High growth rate ＞0.7Å/cycle Excellent step coverage for A/R ＞40:1 L...

Wintel Doped ACL

• Manufacturer: Wintel

LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV High removal rate of new hard mask materials W doped ACL : 6000Å/min B doped ACL : 5000Å/min Good selectivity against dielectric materials SiO2...

MD TOTCO 122010 CVD DRIFT RECORDING INSTRUMENT

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