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New Deposition Equipment (Cvd, Pvd) in Gyeonggi-do, South Korea

  • Wintel PE ALD

    Wintel PE ALD

    • Manufacturer: Wintel

    LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Low-temperature Si3N4 Wafer temperature ≥250℃ Good film quality (WER, R.I) High growth rate ＞0.7Å/cycle Excellent step coverage for A/R ＞40:1 L...

    Gyeonggi-do, South Korea
  • Wintel Doped ACL

    Wintel Doped ACL

    • Manufacturer: Wintel

    LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV High removal rate of new hard mask materials W doped ACL : 6000Å/min B doped ACL : 5000Å/min Good selectivity against dielectric materials SiO2...

    Gyeonggi-do, South Korea