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2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher
- Manufacturer: Oxford
Model Year : 2003 Quantity : 1 Condition : Refurbished with OEM specifications Supports wafer sizes up to 300mm (330mm Platen) RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C...
Asia - Trusted Seller
2004 Oxford PlasmaLab System 133+ RIE CL Reactive Ion Etcher
- Manufacturer: Oxford
Was refurbished with OEM specifications Configuration: Supports wafer sizes up to 300mm (330mm Platen) Mechanical chuck RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C End p...
Asia
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