Plasmatherm SLR720 shuttle lock RIE for compound semiconductor etching
- Manufacturer: Plasma-Therm
- Model: SLR-720
Plasmatherm SLR-720 RIE tool Configured for etching of metals and compound semiconductors Previous usage was etching of GaAs with chlorine chemistry PC controller. Vacuum load lock with wafer transfer robot. ...
Plasmatherm SLR 770 shuttle lock ICP inductively coupled plasma etch system for compound semiconductor process
- Manufacturer: Plasma-Therm
- Model: SLR
Plasmatherm SLR-770 ICP Shuttle Lock Inductively Coupled Plasma Etch System. Configured for etching of metals and compound semiconductors Previous usage was deep etching of GaAs with chlorine chemistry PC cont...
GaSonics PEP 3510A/A Dual Chamber
- Manufacturer: GaSonics
The GaSonics PEP 3510A is a versatile microwave downstream photoresist removal system, designed for clean, damage-free removal of photoresist. PEP 3510A utilizes a combination of platen and lamp wafer heating res...
San Jose, CA
GaSonics L3510 Single Wafer Ashing System
- Manufacturer: GaSonics
The GaSonics L3510 is a versatile downstream photoresist removal system, designed for clean, damage-free removal of the most difficult resist structures. Utilizing the production-proven L-Series platform, the L35...
San Jose, CA
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