Used processing in Bavaria, Germany

1995 WET Clean with Ultrasonic Cleaner 8''

• Manufacturer: Tokyo Electron - TEL

WET Clean with Ultrasonic Cleaner 8'' WET Clean with Ultrasonic Cleaner

1996 ASM Advance 400

• Manufacturer: ASM
• Model: ADVANCE 400

ASM Furnace Vertical 2 Reactor atmospheric Reactor 1 is missing heater cassette, Motor driver, Board and loader arm

1999 ASM Advance 400

• Manufacturer: ASM
• Model: ADVANCE 400

ASM Furnace Vertical - Advance 400 2 Reactors atmospheric

1995 CDE CDE80/2 Plasma Etch

• Manufacturer: CDE

The system was in production until February 2025. Plasma Etch

1995 CDE CDE80/3 Plasma Etch

• Manufacturer: CDE

The system was in production until February 2025. Plasma Etch

2000 ASM Advance 400

• Manufacturer: ASM
• Model: ADVANCE 400

ASM Furnace Vertical - Advance 400 2x Reactor Dot. Poly Low Pressure

2004 LAM Research Corp. Allian

• Manufacturer: Lam Research - Novellus

Minimum: 150 mm | Maximum: 200 mm | Set size: 200 mm | Number of chambers: 0 | Process capabilities: 4 Chamber System | Controller type: PC Controller Type | Software revision level: Next | Power requirements: 3...

2008 ASM Advance 400

• Manufacturer: ASM
• Model: ADVANCE 400

ASM Furnace Vertical - Advance 400 2 Reactor atmospheric Robot defect and need service

1999 ASM Advance 400

• Manufacturer: ASM
• Model: ADVANCE 400

OFENV01DFurnace with 2 Tubes 1x Reactor Dot. Poly Low Pressure 1x Reactor Atmosphere WET-OXID

2012 AMAT DXZ/CXZ Chamber

• Manufacturer: Amat

3 DXZ/CXZ Chambers for Centura/P5000Mainframe is transport rack

2008 LAM Research Corp. 2300 Kiyo

• Manufacturer: Lam Research - Novellus
• Model: 2300 KIYO

Semiconductor ETC Chamber with RF Cart Incl. Gasbox and Rocker Valve

2016 Nexx Apollo PVD

The Nexx Apollo PVD system is a fully automated Physical Vapor Deposition (PVD) tool using a multiple wafer multiple chamber design. The system deposits thin metal films used in interconnect metallization on wafe...