Tokyo Electron - TEL Lithius Specifications

Specifications

Process capabilityphotoresist coating, pre/post-spin bake
Supported wafer sizes100-300 mm
Automationautomated wafer handling and cassette interface
Spin controlprogrammable spin profiles and acceleration
The above specifications are based on the 2005 model year.

Tokyo Electron - TEL Lithius description

The TEL Lithius is a precision photoresist coating tool designed for semiconductor front-end production. Built for repeatable, low-defect resist application and solvent handling, it integrates automated wafer handling, programmable spin profiles and process controls to support laboratory and production environments seeking consistent film uniformity and high uptime.

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