Amat P5000 Specifications

Specifications

Process typesPVD, CVD
Wafer size200-300 mm
Chamber configurationModular multi-chamber
Throughput50-200
The above specifications are based on the 2000 model year.

Amat P5000 description

The Amat P5000 is a high-throughput deposition tool designed for semiconductor thin-film processes. Built to support multiple vacuum deposition technologies, the P5000 balances process flexibility and repeatable film quality for production and R&D environments. Its modular architecture allows integration into cluster fabs and supports common wafer sizes used in front-end manufacturing.

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