- Trusted SellerMake OfferHachioji, JapanVisit Auction Website
CVD system Concept-150/200
- Manufacturer: Lam Research - Novellus
This system is applicable to 4/5/6 and 8-inch wafers and forms silicon oxide and silicon nitride films on the wafers by plasma CVD method. The basic configuration consists of three modules: a process module, an R...
Tokyo, Japan- Tokyo, Japan
2016 ULVAC SIV-500
- Manufacturer: Ulvac
- Model: SIV-500
Manufacturing process: film deposition | Inch: 6
Tokyo, Japan- Tokyo, Japan
WATKINS JOHNSON WJ-999R
- Manufacturer: Watkins-Johnson
- Model: WJ-999R
Manufacturing process: film deposition | Inch: 6
Tokyo, Japan- Tokyo, Japan
WATKINS JOHNSON WJ900、1000シリーズ
- Manufacturer: Watkins-Johnson
This equipment is, 4/5/6 and 8-inch wafers. inch wafers, and can be used for plasma CVD The system is designed for 4/5/6 and 8-inch wafers and forms silicon oxide and silicon nitride films on wafers by the plasma...
Tokyo, Japan- Tokyo, Japan
2003 ANELVA C-7730FH
- Manufacturer: Anelva
- Model: C-7730FH
Manufacturing process: film deposition | Inch: 4
Tokyo, Japan2008 KOKUSAI DJ-853V
- Manufacturer: Kokusai
- Model: DJ-853V
Manufacturing process: film deposition | Inch: 6
Tokyo, Japan2006 ULVAC ei-5
- Manufacturer: Ulvac
- Model: EI-5
Manufacturing process: film deposition | Inch: Square Substrate
Tokyo, Japan2006 ULVAC ei-5
- Manufacturer: Ulvac
- Model: EI-5
Manufacturing process: film deposition | Inch: Square Substrate
Tokyo, Japan- Tokyo, Japan
- Tokyo, Japan