Used etcher in Gyeonggi-do, South Korea

2009 SUNIC, TENACIER-400VE, ICP Etcher

• Manufacturer: SUNIC

220VAC, 3Phase, 60Hz, 100A Pneumatic Air 5~7kgf/c㎡, Gas 1.5~2kgf/c㎡ - DESCRIPTION: 220VAC, 3Phase, 60Hz, 100A Pneumatic Air 5~7kgf/c㎡, Gas 1.5~2kgf/c㎡ - CONDITION: Working/Deinstall, As-is

Poly Etcher System (Conductor Etcher System)

Developing and supplying equipment with increasing demand in accordance with market trend We have secured the lineup of Poly Etcher System for 300mm Wafer to keep up with the increasing demand.

2011 Tainics, TE3100, ICP Etcher

• Manufacturer: Tainics

Normal GaN Etch, High GaN Etch, PSS Etch - CONDITION: Working/Deinstall, As-is

2011 Tainics, TE3100, ICP Etcher

• Manufacturer: Tainics

Normal GaN Etch, High GaN Etch, PSS Etch - CONDITION: Working/Deinstall, As-is

DAESUNG, ET214, SEED ETCHER (ETCH STATION)

• Manufacturer: DAESUNG

Wafer 200mm - VINTAGE: Unknown - CONDITION: As-is Equipment detail: SEED ETCHER(ETCH STATION) | Description: Wafer 200mm

2013 Oxford, Plasmalab100-ICP380, ICP Etcher

• Manufacturer: Oxford

N/A - CONDITION: As-is Equipment detail: ICP Etcher | Description: N/A

2015 Gigalane, MAXIS-300Lah, ICP Etcher

• Manufacturer: Gigalane

Wafer up to 6" - CONDITION: Working Equipment detail: ICP Etcher | Description: Wafer up to 6"

2011 Gigalane, MAXIS 300Lah, ICP Etcher

• Manufacturer: Gigalane

Wafer up to 6" - CONDITION: Working/Deinstall, As-is

2010 Top Eng, LX-380, ICP Etcher

• Manufacturer: Top ENG

N/A - CONDITION: Working/Deinstall, As-is Equipment detail: ICP Etcher | Description: N/A

2010 Top ENG, LX-380, ICP Etcher

• Manufacturer: Top Eng

N/A - CONDITION: Working/Deinstall, As-is Equipment detail: ICP Etcher | Description: N/A

2012 Plasma Therm, VERSALINE, ICP-RIE Etcher

• Manufacturer: Plasma-Therm
• Model: VERSALINE

Wafer 200mm (Max) - CONDITION: Working/Deinstall, As-is

Metal Etcher System

2013 Oxford, Plasmalab ICP380-PLASMALAB100, ICP Etcher + PECVD

• Manufacturer: Oxford

N/A - CONDITION: As-is Equipment detail: ICP Etcher + PECVD | Description: N/A

Wintel Poly Etcher

• Manufacturer: Wintel

LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Application : DPT, QPT, Hard mask etch etc. Excellent Uniformity ＜1% (Concentric profile) Improved wafer edge uniformity : Wide plasma generati...

PSK Inc. PSK 300mm Etcher MKS Micr

• Manufacturer: PSK Inc.

MAKER : PSK INC. MODEL : PSK TERA21RC Etcher CHAMBER Description PSK TERA21RC Etcher CHAMBER included MKS Microwave Source (Plasma Subsystem) with Generator Rack(MKS FI20160-1 2ea) ASTEX FI20608 ...