- Trusted Seller
Hitachi Wafer Alignment Unit and Controller M-712E Shallow Trench Etcher Used
- Manufacturer: Hitachi
- Model: M-712E
Hitachi Wafer Alignment Unit and Controller M-712E Shallow Trench Etcher Used Inventory # AA-1398 This Hitachi pre-aligner is used working surplus. It was removed from a working hitachi M-712E. Some notable compo...
$508 USDAlbuquerque, NM - Trusted Seller
Hitachi Wafer Alignment Unit M-712E 200mm Shallow Trench Etcher Working
- Manufacturer: Hitachi
- Model: M-712E
“Removed from a Hitachi M-712E 200mm Shallow Trench Etcher System. The panels have some minor scuffs (see photos).” Hitachi Wafer Alignment Unit M-712E 200mm Shallow Trench Etcher Working Spare Removed from a Hit...
$603 USDAlbuquerque, NM 
GaSonics AE-2000LL Isotropic Etcher
- Manufacturer: GaSonics
The GaSonics Aura Loadlock Isotropic Etcher (AE-2000LL) is a microprocessor-controlled down-stream etcher that etches the font, and optionally, the backside of a wafer. The AE-200LL uses a dual-pumping loadlocked...
San Jose, CA- Trusted Seller

2006 Oxford PlasmaLab System 100 RIE (FL) Reactive Ion Etcher
- Manufacturer: Oxford
Condition : Refurbished with OEM specifications Configuration: - Supports wafer sizes up to 300mm (330mm Platen) - RIE set up for SiO2 Etch - RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, - Chamber ...
Asia - Trusted Seller

2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher
- Manufacturer: Oxford
Model Year : 2003 Quantity : 1 Condition : Refurbished with OEM specifications Supports wafer sizes up to 300mm (330mm Platen) RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C...
Asia - Trusted Seller

2004 Oxford PlasmaLab System 133+ RIE CL Reactive Ion Etcher
- Manufacturer: Oxford
Was refurbished with OEM specifications Configuration: Supports wafer sizes up to 300mm (330mm Platen) Mechanical chuck RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C End p...
Asia 
Vacuum Etching Machine Acid Etcher Alkaline Etching PCB Production Line
Vacuum etching machine uniformity ≥90% , etching factor ≥3.5 times. The vacuum suction device makes the spray operating system generate negative pressure, forming a low suction force, absorbing the etching liquid...
Beijing, China
HMS Etching Line
- Manufacturer: HMS
Qty.: 2; Contact: Mr. Mark Lai; Shipping term: Ex-factory Price negotiable Payment term: TT in advance Condition: As it is
Suzhou, China

