Used systeme

Trusted Seller
2015 LAM 2300 E5 KIYO EXP
- Manufacturer: Lam Research - Novellus
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2014 LAM 2300 E5 KIYO45
- Manufacturer: Lam Research - Novellus
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2007 LAM 2300 Versys METAL
- Manufacturer: Lam Research - Novellus
- Model: 2300 VERSYS METAL
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2011 LAM 2300 E4 KIYO45
- Manufacturer: Lam Research - Novellus
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2011 LAM 2300 E5 KIYO E Series
- Manufacturer: Lam Research - Novellus
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2012 LAM 2300 KIYO45
- Manufacturer: Lam Research - Novellus
- Model: 2300 KIYO45
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2005 TEL SCCM-SHIN
- Manufacturer: Tokyo Electron - TEL
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2011 TEL Telius SCCM Jin
- Manufacturer: Tokyo Electron - TEL
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
Trusted Seller
2008 AMAT DPS G5
- Manufacturer: Amat
- Model: DPS G5
De-installed, Warehoused, Can be inspected Wafer size: 300MM
Seoul, South Korea
JCXstone stone impact etching machine granite impact etchers glass marble engraving
- Manufacturer: JCX-Y
Carving material black granite black marble other black stone Simple installation after receiving the goods, video guidance. Gift U disk, diamond cutter head and so on. Design and use of new functions color glass...
$5,600 USD
Beijing, China
Trusted Seller
2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher
- Manufacturer: Oxford
Model Year : 2003 Quantity : 1 Condition : Refurbished with OEM specifications Supports wafer sizes up to 300mm (330mm Platen) RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C...
Asia
Trusted Seller
2004 Oxford PlasmaLab System 133+ RIE CL Reactive Ion Etcher
- Manufacturer: Oxford
Was refurbished with OEM specifications Configuration: Supports wafer sizes up to 300mm (330mm Platen) Mechanical chuck RIE set up for GaN Etch RF Power: 600W, 13.56MHz Water cooled electrode 10C-80C End p...
Asia
Trusted Seller
2006 Oxford PlasmaLab System 100 RIE (FL) Reactive Ion Etcher
- Manufacturer: Oxford
Condition : Refurbished with OEM specifications Configuration: - Supports wafer sizes up to 300mm (330mm Platen) - RIE set up for SiO2 Etch - RF Generator : Advanced Energy RFX 600A ; 600W, 13.56MHz, - Chamber ...
Asia
2008 Dry Etcher ULVAC NE5000N
- Manufacturer: Ulvac
GAS BOX CONFIG GAS 1: AREA FC-780C 50 SCCM Cl2 GAS 2: AREA FC-780C 50 SCCM SiCl4 GAS 3: AREA FC-780C 50 SCCM CH2Cl2 GAS 4: AREA FC-770AC 200 SCCM O2 GAS 5: AREA FC-770AC 50 SCCM SF6 GAS 6: AREA FC-770AC 100...
Wu Xi Shi, China
2012 ICP Etcher ULVAC NE950
- Manufacturer: Ulvac
GAS BOX CONFIG GAS 1 HORIBA STEC SEC-E40 Ar 100SCCM GAS 2 HORIBA STEC SEC-E40 O2 100SCCM GAS 3 HORIBA STEC SEC-E40 CHF3 100SCCM GAS 4 HORIBA STEC SEC-E440J BCL3 200SCCM GAS 5 HORIBA STEC SEC-E440J CL2 200SCC...
Wu Xi Shi, China