Used controller in China

2011 PECVD Double Chamber ULVAC CME-200J Plasma-Enhanced Chemical Vapor Deposition)

• Manufacturer: Ulvac
• Model: CME-200

CHAMBER 1 GAS BOX CONFIG GAS 1 Aera TC FC-R7800 SiH4(10%)/N2 500SCCM GAS 2 Aera FC-7700 N2O 2000SCCM GAS 3 Aera FC-7700 O2 100SCCM GAS 4 Aera FC-7700 CF4(0.424) 500SCCM PROCESS CHAMBER 1 CONGIF 250MMX250MM ...

Roll to roll coating equipment

Roll to Roll coating equipment is use for flexible materials surface coating kinds of dielectric film( SiO2, Si3N4, Al2O3, SnO2, ZnO, Ta2O5), metal or alloy film ( Al, Cr, Cu, Fe, Ni, SUS, TiAI), transparent cond...

CVD Tube Furnace

CVD split type tube furnace Three gas channels with MFC High purity quartz tube Products Description CVD tube furnace is composed of a tubular heating furnace, MFC gas system and vacuum system. The heating furnac...

CVD Mini Tube Furnace

1.1200C CVD mini tube furnace 2.Spilt door type 3.30 or 50segments temperature controller,PID control,±1℃ 4.Three gas channles system float flowmeter. 5.H2 burning and inspection system included Products Descript...

PVD Physical vapor deposition

PVD Physical vapor deposition Product introduction: It is widely used in the batch production of semiconductor and LED production lines, and can meet the various process requirements for the uniform deposition of...

PECVD Plasma enhanced chemical vapor deposition equipment

PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...

Inductive coupling plasma etching (icp) system

Inductive coupling plasma etching (icp) system Project configuration and machine structure diagram Process result Quartz / silicon / grating etching Using BR mask to etch quartz or silicon materials, the grating ...

MDPS-560 Pyriform Double Chamber Sputtering System

Used for preparing single/multi-layer functional nanofilms including various hard, metallic, semiconducting and dielectric films for universities and science institutions. Sputtering vacuum chamber, magnetron spu...

MDICP-5000F Fully automatic ICP etching machine

MDICP-5000F Fully automatic ICP etching machine 1．System overview ▲Executive summary The equipment is a two chamber vacuum system. One chamber is the injection sampling chamber and the other is the etching chambe...