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PLASMA-THERM 790 Reactive Ion Etcher
- Manufacturer: Plasma-Therm
- Model: 790
- Manually Loaded Process Chamber with 8” (dia.) Cathode - Gas Distribution Panel with 4ea Gas Channels - MKS 1479 Metal Sealed Mass Flow Controllers - 4ea Additional Gas Channels Available - RFPP RF5S RF Generat...
United States - Trusted Seller
2011 APPLIED MATERIALS Centura TPCC EPN
- Manufacturer: Amat
- Model: Centura
- Serial Number 21693; Manufactured in 2011 - Electro Polished Nickel Frame & Modules - 2ea ENP Centura Loadlocks for 200mm Wafers - Wafer Transfer Chamber with HP Robot - High Temperature Quartz End Effector - O...
United States - Trusted Seller
2022 Novellus/ LAM Concept Two Speed NExT CVD 8"
- Manufacturer: Lam Research - Novellus
- Wafer Shape: Notch - SMIF Interface: Yes - Cassette Loader: LPI 2200 - Loadlock Indexer Robot: Indexer II - PEC slot: MPS with one cool station - Main power distributer: PDP - System Main Power: 3¢5Wires ...
United States MRL Industries Bandit 218 LPCVD Furnace
- Manufacturer: Bandit
200mm LPCVD furnace tube 1: TEOS/anneal tube 2:Nitride/poly, gas connections: air low N2, N2, FG1, Ar, O2, SiH2Cl2(DCS), SiH4, NH3 2 Kashiyama vacuum pumps with blowers Schumacher M-Dot dopant source controll...
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AMAT Centura EPI
- Manufacturer: Amat
- Model: Centura
Centura HTF EPI 3ch ATM, 200mm, s/n H046 system for sale As Is Complete and “Power On”. - 480V/50Hz/600A ‐ Centura HTF Toxic Epi mainframe ‐ Centura HTF Controller - Flat panel monitor - Widebody loadlocks ...
ASIA - Trusted Seller
Europlasma plasma - decoating system from solut As 200 DLC
- Manufacturer: solut
Plasma decoating system from solut Type: As 200 DLC Plasma decoating system Plasma decoating system from solut Plasma system for the decoating of DLC Vacuumrecipient 200 x 200 x 200 mm Microprocessor control for ...
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Novellus C2 Altus spare parts, Sabre spare parts
- Manufacturer: Lam Research - Novellus
- Model: Altus
Contact us with your parts request NOVELLUS OEM TOOL TYPE # of Units TARA PART # PART NAME Part Number NOVELLUS C2 ALTUS 4 100303 ASSY,VENT PURGE 02-834770-00 NOVELLUS C2 ALTUS 19 100304 IO CONTROLLER 27-1015...
Trim, Ireland - Trusted Seller
2011 Applied Materials Producer eXT
- Manufacturer: Amat
- Model: Producer
Process: poly etch Wafer size: 300mm Carrier: FOUP (Comply with SEMI E47.1 (25wafers)) Load Port: 3 Loadport Facility Plate: N2 Regulator :CDA regulator 125 PSI onboard SMC pressure switch Anti-corrosion Pac...
Asia - Trusted Seller
1996 AMAT Centura HDP→5300Omega
- Manufacturer: Amat
- Model: Centura
As is, where is 2ch:SiO2 D/E CH-A/B Process Contact window dry etching Wafer Size 8” Wafer Shape Notch Wafer Cassette 8" Plastic Miraial SMIF Interface NO Equipment composition 1.Equipment body 2.Primary ...
Asia - Trusted Seller
Applied Materials Centura AP Enabler
- Manufacturer: Amat
- Model: Centura
Applied Materials Centura AP Enabler Dielectric Etch Currently Configured for 300mm wafer size EQUIPMENT DETAILS: Process: OX From original tool PO, please inspect to verify Software Revision: B2.8_79 FI S...
Asia - Trusted Seller
AMAT Centura II DPS Plus POLY
- Manufacturer: Amat
- Model: Centura
* 6 inch setting * Current Working As-is * Condition Excellent * After refurbishment, take out A. General Information Manufacturer Applied Material inc. Model DPS PLUS POLY Technology Poly Etch Platform Ty...
Asia CVD Tube Furnace
CVD split type tube furnace Three gas channels with MFC High purity quartz tube Products Description CVD tube furnace is composed of a tubular heating furnace, MFC gas system and vacuum system. The heating furnac...
Henan, ChinaNEBULA SERIES: Semi/ Fully Automated Cluster
LIMITS: THERE AREN’T ANY We dream with you to determine the modules that will bring your potential innovations to reality. PVD, CVD, ALD, masking and parking transfer, stages with heating/cooling, sources that as...
SingaporePECVD Plasma enhanced chemical vapor deposition equipment
PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...
Guangzhou, China