Hitachi Kokusai Electric DJ-1206VN-DM(Quixace1-ALDINNA) 12(300mm)
Chemical Vapor Deposition (CVD) systems deposit thin films and coatings by chemically reacting vapor-phase precursors on a substrate. CVD equipment ranges from small R&D tools to large production reactors for semiconductors, optics, and specialty coatings. Buyers look for chamber condition, process control, gas handling, and compatibility with target chemistries to ensure performance and uptime.
Inspect chamber integrity, heater and susceptor condition, vacuum pumps, gas lines and valves, control software, and spare parts availability. Request maintenance logs, process recipes, and confirm the system was used with compatible chemistries and properly decontaminated.
Purge and decontaminate the tool according to supplier and regulatory rules, drain and isolate gas cabinets, disconnect utilities, and secure fragile components. Use experienced riggers and transporters familiar with vacuum equipment and provide documentation for hazardous materials if applicable.
Regularly replace seals and o-rings, service vacuum pumps and gas delivery components, clean the chamber and susceptor, calibrate sensors and mass flow controllers, and keep detailed process logs. Follow manufacturer service intervals and stock critical spare parts.