Building Filters

Ion Etching System
Substrate:CarbideCoating type:AlCrN(2-3μm) Series: IE series | Size: W 2,300mm | Weight: D 1,400mm | Gas: H 2,350mm | Ion guns: Approx. 1,600kg | Max elec. consumption: Ar, O2 | Carbon: 4, 6, 8 sources | Nitridin...
Kobe, Japan
Thinner Recycling System
DRESTER DYNAMIC TRIPLE Thinner Recycling System Thinner used for cleaning Recycled thinner Recycler Docking Unit Gun Cleaner Dresdor Dynamic Triple is a complete recycling system for thinner, consisting of a recy...
Tokyo, Japan
Diamond Coating System
System/method: Hot Filament CVD | Device dimensions(mm): L2,480×W1,320×H2,240 | Chamberdimensions (mm): L620×W600×H500 | Can be installedsize (mm): Tool: φ0.5 - φ20 L200Flat plate: φ250 t30 | Substrate material:...
Kobe, Japan
Kobe, Japan
Kobe, Japan
Batch type vapor deposition + plasma polymerization system
Substrate size(including jigs, etc.): φ540×1,500mm 2 axes
Kobe, Japan
2010 Alfur Design ACM-2000
- Manufacturer: アルフアーデザイン
Moisture-proof coating on right to left (front fixed) blint substrates Maximum substrate covered: 330 x 250 mm 1 head 0 to 180 degrees Maximum number of coating points: 350 points Accessories Loader/Unloader set ...
Nara, Japan
