ASM SIEMENS 03056002 2020 Nozzle
- Manufacturer: ASMPT
Shenzhen, China
ASM SIEMENS 03099718-01 4036 Nozzle
- Manufacturer: ASMPT
Shenzhen, China
20668000 Universal AI VOLUME CHAMBER
- Manufacturer: Yinuo
Shenzhen, China
YMDA16X35-12W KV7-M9283-001 Cylinder
- Manufacturer: Yinuo
Shenzhen, China
YAMAHA 73A NOZZLE KV8-M7730-00X
- Manufacturer: Yamaha
Shenzhen, China
ASM SIEMENS 03099722-01 4135 Nozzle
- Manufacturer: ASMPT
Shenzhen, China
Samsung Hanwha HM520 VN030 VN040 NOZZLE
- Manufacturer: Hanwha
Shenzhen, China
Shenzhen, China
PVD Physical vapor deposition
PVD Physical vapor deposition Product introduction: It is widely used in the batch production of semiconductor and LED production lines, and can meet the various process requirements for the uniform deposition of...
Guangzhou, China
CVD equipment for graphene and carbon nanotube materials
CVD equipment for graphene and carbon nanotube materials Product introduction The equipment is mainly used for the process coating of graphene and nano materials; Diffusion, oxidation and annealing of polycrystal...
Guangzhou, China
PECVD Plasma enhanced chemical vapor deposition equipment
PECVD Plasma enhanced chemical vapor deposition equipment Product introduction ◆ Fully automatic control of process time, temperature, gas flow, valve action and reaction chamber pressure is realized by industria...
Guangzhou, China
Guangzhou, China
Inductive coupling plasma etching (icp) system
Inductive coupling plasma etching (icp) system Project configuration and machine structure diagram Process result Quartz / silicon / grating etching Using BR mask to etch quartz or silicon materials, the grating ...
Guangzhou, China
Guangzhou, China
Guangzhou, China
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