Building Filters

SCHERING Galvanotechnik, chem. Tin Filter
- Manufacturer: Galvanotechnik
Aldersbach, Germany
Ulvac
- Manufacturer: Ulvac
Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...
Munich, Germany
Ulvac
- Manufacturer: Ulvac
NE550H is a multipurpose high-density plasma etching system, specifically for R&D test facilities such as universities and government agencies. Equipped with low-pressure, low-electron-temperature and high-densit...
Munich, GermanyUlvac
- Manufacturer: Ulvac
Batch type equipment of chemical dry cleaning for remoral of native oxide in Narrow and Deep-contact patterns of advanced semiconductor. Damage-free (remote plasma and low-temperature process) High throughput and...
Munich, Germany
Ulvac
- Manufacturer: Ulvac
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source. ICP type etching chamber, CCP or Ashing chamber is also selectable as 2nd chamber. Low process pressure, high den...
Munich, Germany
1999 LAM Research Corp. TCP 9600
- Manufacturer: Lam Research - Novellus
- Model: TCP 9600
- without UI Computer - Envision, ESC, Fixed Gap Set size: 200 mm | Power requirements: 208 V 80.0 A 50/60 Hz 3 Phase | Ce marked: YES | Width: 120.000 in (304.8 cm) | Depth: 250.000 in (635.0 cm)...
Regensburg, Germany
