New Surface Treatment / Cleaning

Samsung Hanwha CN020 NOZZLE

• Manufacturer: Hanwha

ASM SIEMENS 03059989 2039 Nozzle

• Manufacturer: ASMPT

Samsung Hanwha SM400 NOZZLE

• Manufacturer: Hanwha

Samsung Hanwha SM431 J90551228A cp45FV SM320 Nozzle rod

• Manufacturer: Hanwha

Atmospheric rotary plasma surface treatment machine Atmospheric rotary plasma surface treatment

• Manufacturer: Minder Hightech

Atmospheric rotary plasma surface treatment SPA2800HTechnical specifications(high power version) （1）Product description （1.1）The role of plasma cleaning The principle of plasma cleaning is mainly： （A）Etching on t...

Semi Auto- Plasma cleaning

• Manufacturer: semiconductor equipment manufacturing

Semiconductor Equipment Manufacturing Co., Ltd. is a well-known company that provides semiconductor equipment products. We provide strict quality control in the company. All our products meet the requirements and...

MD-SPV150 Vacuum plasma surface treater

• Manufacturer: Minder Hightech

（1.1）The role of plasma cleaning The principle of plasma cleaning is mainly： （A）Etching on the surface of materials - physical effects A large number of active particles in the plasma, such as a large number of i...

Point-of-Use 3300

Provides uniform and repeatable temperature control The model POU3300 Point-of-Use Thermoelectric Temperature Control System provides uniform and repeatable temperature control for plasma etch applications. The P...

Ulvac

• Manufacturer: Ulvac

Dry etching system for high volume production with good cost performance and wide selection of tool configuration. GaN Recess with selectivity to AlGaN >350 precise etch stop using laser interferometry EPD low da...

PMM-2550AH

PMM-2550AH Semiconductor industry, electronic connector industry, ceramic industry, tungsten steel industry, precision and high precision parts processing industry, precision mold industry, etc.

Reactive Ion Etching System

Reactive Ion Etching (RIE) is a plasma etching technology to fabricate micro and nano-structures. During RIE etching processes, volatile compounds are formed in interaction of sample surfaces and high-energy ions...