- Trusted Seller

Ultrasonic Vibrator Bath for Wet Benches
The Kaijo Corporation Ultrasonic Vibrator Type 78S is designed for ultrasonic agitation in wet processing applications, commonly integrated into wet benches and ultrasonic process tanks. It provides consistent ul...
Rocklin, CA - Trusted Seller

Vacuum Wand Kit for Wet Benches
This vacuum wand set is optimized for handling 200mm silicon wafers in wet bench applications. The system is ESD safe and configured for use with an external vacuum source, ensuring safe and reliable operation in...
Rocklin, CA 
DISPOSABLE ESD GRD4560 HEEL GROUNDER FOR STATIC CONTROL - LOT OF 55 UNITS - NEW
DISPOSABLE ESD GRD4560 HEEL GROUNDER FOR STATIC CONTROL - LOT OF 55 UNITS P/N: GRD4560 LOT OF 55 UNITS BRAND NEW CONDITION LOC S-1
Largo, FL
BELKIN A3L980-150-BLUS CAT6 UTP SNAGLESS PATCH CABLE 150ft - BRAND NEW
BELKIN A3L980-150-BLUS CAT6 UTP SNAGLESS PATCH CABLE 150ft - BRAND NEW P/N: A3L980-150-BLUS 150 FEET LONG MADE IN USA BRAND NEW CONDITION LOC OFF-03
Largo, FL
TFP-2310
The equipment is equipped with 3 polishing stations and 8 polishing heads, which has high processing efficiency. It has polishing disc cooling and temperature monitoring system to ensure the constant temperature ...
Beijing, China
TMP-150/200
This series of equipment is suitable for CMP polishing equipment for thin films (dielectric layers), including oxide, metal, STI, SOI, MEMS and other products of flat polishing. Adopting airbag film flexible pres...
Beijing, China
Wintel LPR (Low-Pressure Removal)
- Manufacturer: Wintel
LPR (Low-Pressure Removal) PE ALD Poly Etcher HARC Doped ACL EER EUV Normal ashing process with unique plasma source is possible. In particular, excellent results can beobtained from low O2 & No O2 processes. Low...
Gyeonggi-do, South Korea
Cassette type Batch plasma PR removal machine
- Manufacturer: Minder Hightech
Application: DESCUM Wafer cleaning Removing residual glue after wet process Surface residue removal Remove residual glue after exposure and development
Guangzhou, China
ICP lab type PR removal machine
- Manufacturer: Minder Hightech
Application ASHING Polymer removal DESCUM Dry removal of hard mask layer Photoresistance removal after female ion implantation Removal of optical resistance between media Photoresistance removal in BAW/SAW proces...
Guangzhou, China
200885 03131238 PC POWER SUPPLY
- Manufacturer: Yinuo
Shenzhen, China
KV8-M8870-002 KV8-M8870-00X SYRINGE OIL
- Manufacturer: Yinuo
Shenzhen, China
J9055260B NOZZLE CN110 ASSY J9055260B
- Manufacturer: Yinuo
J9055260B NOZZLE CN110 ASSY J9055260B We are comimitted to establish long-term and friendly partnership with each customer .our specalty lies in quaity products, speedy delivery andreliable services.For Exact Pri...
Shenzhen, China
NI CB-68LPR terminal block 777145-02
- Manufacturer: Yinuo
Shenzhen, China
Samsung Hanwha CN020 NOZZLE
- Manufacturer: Hanwha
Shenzhen, China
ASM SIEMENS 03059989 2039 Nozzle
- Manufacturer: ASMPT
Shenzhen, China

