Used Lithography (Photolithography)

Universal Genesis G14 Pick & Place machine

• Manufacturer: Universal

Specification: Universal Genesis GI14D 4988E + PTF - 2 axis with linear motors - 2 placement heads FlexJet 3, each with 7 spindle (total 14 spindle) - 4 camera's: 1 digital camera front fix side 1 digital camera ...

Nikon Reticle Trolleys Qty 2

• Manufacturer: Nikon

Two Reticle Trolleys Brand new, Custom made for Nikon Reticles for a World leading Fab, Now surplus to requirements. For Nikon 6" Reticles

Suss Microtec ACS 800 Coater Developer

• Manufacturer: SÜSS MicroTec
• Model: ACS 800

For full spec and Layout click on below Link TRACK_07 Coat chambers 2 ea Develop chambers 1ea Dehydration plate 1ea Hotplates 4ea

Cymer ELS 4000D Laser System

• Manufacturer: CYMER

Cymer ELS 4000 Laser System 248nm KrF Excimer DUV laser Max average power 50 W Max pulse energy 0.5 J Duration 10-50 ns

Polyimide Apply Hood

• Manufacturer: POLYIMIDE APPLY HOOD

Polyimide Apply Hood

GCA ULTRATECH XLS 7800 248nm DUV Stepper

• Manufacturer: Ultratech

GCA ULTRATECH XLS 7800 248nm DUV Stepper GCA Ultratech XLS 7800 full field (22 squared mm), NA=0.51, 4X reduction step and repeat exposure tool using a 248nm laser source.

Envirco Corp, Resist Apply Laminar Flow Hood

• Manufacturer: ENVIRCO CORP

Envirco Corp, Resist Apply Laminar Flow Hood

Karl Suss MA56 Mask Aligner

• Manufacturer: SÜSS MicroTec
• Model: MA56

Karl Suss MA56 Mask Aligner The Karl Suss MA 56 is a mask alignment and exposure system which offers unsurpassed, highly economical mass production capabilities for cassette to cassette handling of wafers up ...

SVGL MICRASCAN MPT 193nm Scanner

• Manufacturer: SVGL

SVGL MICRASCAN MPT 193nm Scanner SVG DUV (193nm) stepper configured for processing 200mm wafers and linked to TEL Act 8. Tool uses catadioptric lens design incorporating both reflective and refractive optica...

1993 DNS SKW-60A-BVPE Coater Developer

• Manufacturer: Dainippon Screen
• Model: SK-W60A-BVPE

DNS SK-80BW-AVQE

• Manufacturer: Dainippon Screen
• Model: SK-80

DNS SK-80BW-AVQE

Tokyo Electron ACT 8 2C2D DUV E beam process

• Manufacturer: Tokyo Electron - TEL
• Model: ACT-8

Application: 200mm wafers for I-line, DUV, E-beam resist processes. Purchased in 2010 but the Track was never used. We have detailed configuration. Currrently installed. CSI Semi can provide de-installation and r...

ASML 200 quipement semi-conducteur semiconductor equipment used

• Manufacturer: ASML

DNS SK-80BW-AVPQE

• Manufacturer: Dainippon Screen
• Model: SK-80BW-AVPQE

DNS SK-80BW-AVPQE

DNS SK-80BW-AP

• Manufacturer: Dainippon Screen
• Model: SK-80

DNS SK-80BW-AP