Used source rf in Texas, USA

2000 Oxford PlasmaLab 100

• Manufacturer: Oxford
• Model: PlasmaLab 100

Oxford PlasmaLab 100 Single chamber RIE etcher S/N 219656 150mm Configuration Inductively coupled plasma (ICP) power source: up to 2500 W at 2.4 MHz. Radio frequency (RF) power source: up to 600 W at 13.56 MHz. E...